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Simple general purpose ion beam deceleration system using a single electrode lens

dc.contributor.authorLopes, J.
dc.contributor.authorRocha, J.
dc.date.accessioned2018-03-21T10:00:23Z
dc.date.available2018-03-21T10:00:23Z
dc.date.issued2015
dc.description.abstractIon beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Campus, Sacavém, Portugal (CTN).pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationLOPES, J.; ROCHA, J. – Simple general purpose ion beam deceleration system using a single electrode lens. World Journal of Engineering and Technology. ISSN 2331-4222. Vol. 3, (2015), pp. 127-133.pt_PT
dc.identifier.doihttp://dx.doi.org/10.4236/wjet.2015.33014pt_PT
dc.identifier.issn2331-4222
dc.identifier.issn2331-4249
dc.identifier.urihttp://hdl.handle.net/10400.21/8270
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherScientific Research Publishingpt_PT
dc.relation.publisherversionhttp://file.scirp.org/pdf/WJET_2015080614543190.pdfpt_PT
dc.subjectDecelerationpt_PT
dc.subjectLow energypt_PT
dc.subjectPositive ion beampt_PT
dc.titleSimple general purpose ion beam deceleration system using a single electrode lenspt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage133pt_PT
oaire.citation.startPage127pt_PT
oaire.citation.titleWorld Journal of Engineering and Technologypt_PT
oaire.citation.volume3pt_PT
rcaap.rightsclosedAccesspt_PT
rcaap.typearticlept_PT

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