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Orientador(es)
Resumo(s)
Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Campus, Sacavém, Portugal (CTN).
Descrição
Palavras-chave
Deceleration Low energy Positive ion beam
Contexto Educativo
Citação
LOPES, J.; ROCHA, J. – Simple general purpose ion beam deceleration system using a single electrode lens. World Journal of Engineering and Technology. ISSN 2331-4222. Vol. 3, (2015), pp. 127-133.
Editora
Scientific Research Publishing