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Laser-assisted deposition of thin films from photoexcited vapour phases

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Resumo(s)

Laser-assisted chemical vapour deposition (LCVD) has been extensively studied in the last two decades. A vast range of applications encompass various areas such as microelectronics, micromechanics, microelectromechanics and integrated optics, and a variety of metals, semiconductors and insulators have been grown by LCVD. In this article, we review briefly the LCVD process and present two case studies of thin film deposition related to laser thermal excitation (e.g., boron carbide) and non-thermal excitation (e.g., CrO(2)) of the gas phase.

Descrição

Palavras-chave

Chromium-Oxide Films Dioxide CRO2 Films Boron-Carbide Spin Polarization Carbon Precursor Infrared-Spectra Point-Contact Growth CR(CO)6 Metal

Contexto Educativo

Citação

Conde O, Silvestre, A J. Laser-assisted deposition of thin films from photoexcited vapour phases. Applied Physics A-Materials Science & Processing. ISSN: 0947-8396. 2004: 79 (3), 489-497.

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Editora

Springer

Licença CC