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Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films

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dc.contributor.authorDuarte, A. C.
dc.contributor.authorFranco, N.
dc.contributor.authorViana, A. S.
dc.contributor.authorPolushkin, N. I.
dc.contributor.authorSilvestre, António Jorge
dc.contributor.authorConde, O.
dc.date.accessioned2017-09-29T09:29:23Z
dc.date.available2017-09-29T09:29:23Z
dc.date.issued2016
dc.description.abstractA comparative study of the structural, microstructural and magnetic properties of CrO2 thin films grown onto (110) and (100) TiO2 rutile single crystal substrates by chemical vapor deposition (CVD), using CrO3 as chromium precursor and either oxygen or argon as carrier gas is presented. Our results show that growth under argon carrier gas leads to high quality CrO2 epilayers with structural and magnetic properties similar to those obtained using the more standard oxygen carrier gas. Furthermore, we interpret the larger magnetic coercivity observed for the (110) oriented films in terms of their microstructure, in particular of the highest strain and edge roughness of the building structures of the CrO2 epilayers, which are settled by the substrate crystallographic orientation.pt_PT
dc.description.sponsorshipPTDC/FIS/121588/2010
dc.description.sponsorshipPEst-OE/CTM/UI-00084
dc.description.sponsorshipUID/CTM/04540/2013
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationDUARTE, A. C.; [et al] - Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films. Journal of Alloys and Compounds. ISSN 0925-8388. Vol. 684, (2016), pp. 98-104pt_PT
dc.identifier.doi10.1016/j.jallcom.2016.05.167pt_PT
dc.identifier.issn0925-8388
dc.identifier.issn1873-4669
dc.identifier.urihttp://hdl.handle.net/10400.21/7401
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherElsevierpt_PT
dc.relation.publisherversionhttps://ac.els-cdn.com/S0925838816315006/1-s2.0-S0925838816315006-main.pdf?_tid=434feaac-a4f7-11e7-8520-00000aab0f6b&acdnat=1506676935_391802702156c79b63261c4bb0b3a8d0pt_PT
dc.subjectCrO2 thin filmspt_PT
dc.subjectChemical vapor depositionpt_PT
dc.subjectArgon assisted growthpt_PT
dc.subjectHalf metalspt_PT
dc.subjectX-ray diffractionpt_PT
dc.subjectMagnetic measurementspt_PT
dc.titleArgon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial filmspt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage104pt_PT
oaire.citation.startPage98pt_PT
oaire.citation.titleJournal of Alloys and Compoundspt_PT
oaire.citation.volume684pt_PT
person.familyNameSilvestre
person.givenNameAntónio Jorge
person.identifier.orcid0000-0001-6517-6275
person.identifier.scopus-author-id25224208600
rcaap.rightsclosedAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublicationda27d795-d2eb-4f8c-bfa5-7053ef20f339
relation.isAuthorOfPublication.latestForDiscoveryda27d795-d2eb-4f8c-bfa5-7053ef20f339

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