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Very high fluence nitrogen implantations in metals studied by Rutherford Backscattering Spectrometry

dc.contributor.authorCruz, João
dc.contributor.authorSilva, Hugo
dc.contributor.authorLopes, Jose
dc.contributor.authorRocha, J.
dc.contributor.authorPedro De Jesus, Adelaide
dc.date.accessioned2018-10-09T11:36:05Z
dc.date.available2018-10-09T11:36:05Z
dc.date.issued2018-12-15
dc.description.abstractThis paper reports a study of 14N+ implanted Ti and Zr films analysed by Rutherford Backscattering Spectrometry (RBS). The fluences ranged from 4.0–10.0 × 1017 atoms·cm−2 and energies of 15–20 keV. Here, the nitrogen depth distributions were obtained simultaneously and independently for each RBS spectrum from the direct nitrogen signal and from the reduction of the backscattered yield from Ti and Zr (deficiency method). Fits to the RBS spectra show that the deficiency method clearly underestimates the 14N yield by 32% for Ti (and 45% for Zr) when compared to the direct nitrogen signal. This discrepancy reduces to 23% for Ti (and 43% for Zr) when the presence of nitrogen bubbles are simulated in the fits.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationCRUZ, J.; [et al] – Very high fluence nitrogen implantations in metals studied by Rutherford Backscattering Spectrometry. Surface & Coatings Technology. ISSN 0257-8972. Vol. 355 SI (2018), pp. 169-173pt_PT
dc.identifier.doihttps://doi.org/10.1016/j.surfcoat.2018.01.042pt_PT
dc.identifier.issn0257-8972
dc.identifier.urihttp://hdl.handle.net/10400.21/8897
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherElsevierpt_PT
dc.relation.publisherversionhttps://ac.els-cdn.com/S0257897218300501/1-s2.0-S0257897218300501-main.pdf?_tid=f3348df4-df6a-49f0-9daf-f604f8de1256&acdnat=1539083666_2cc9bc4bd1c5498f7c7a780b25970a46pt_PT
dc.subjectNitrogen implantationpt_PT
dc.subjectRBSpt_PT
dc.subjectDeficiency methodpt_PT
dc.subjectStopping powerpt_PT
dc.titleVery high fluence nitrogen implantations in metals studied by Rutherford Backscattering Spectrometrypt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage173pt_PT
oaire.citation.startPage169pt_PT
oaire.citation.titleSurface and Coatings Technologypt_PT
person.familyNameDuarte Neves Cruz
person.familyNameMiguel Martins Ferreira da Silva
person.familyNameLopes
person.familyNamePedro de Jesus
person.givenNameJoão
person.givenNameHugo
person.givenNameJose
person.givenNameAdelaide
person.identifier.ciencia-id271D-3F24-FE2D
person.identifier.ciencia-id8914-F538-0AD4
person.identifier.ciencia-id5713-0110-AFBA
person.identifier.orcid0000-0003-3242-0328
person.identifier.orcid0000-0002-1516-9891
person.identifier.orcid0000-0003-3793-8898
person.identifier.orcid0000-0003-4938-0000
person.identifier.ridE-1451-2016
person.identifier.scopus-author-id55778145481
person.identifier.scopus-author-id22993489100
rcaap.rightsclosedAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublication0929f7cc-7c37-40c9-beb4-20fc3893a6d1
relation.isAuthorOfPublicationc2465b3d-5720-4412-9ca1-793df1fe2798
relation.isAuthorOfPublication0ace017a-f9e9-4a69-be0b-b1a364cb44ae
relation.isAuthorOfPublication3bd5438d-fd86-47c6-90d6-5bbc76cc6f71
relation.isAuthorOfPublication.latestForDiscovery3bd5438d-fd86-47c6-90d6-5bbc76cc6f71

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