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Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

2020-07-07Journal article Restricted access
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dc.contributor.authorFantoni, Alessandro
dc.contributor.authorCosta, João
dc.contributor.authorLourenço, Paulo
dc.contributor.authorVieira, Manuela
dc.date.accessioned2020-07-10T14:32:48Z
dc.date.available2020-07-10T14:32:48Z
dc.date.issued2020-07-07
dc.descriptionEste trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2016 do Instituto Politécnico de Lisboa. Código de referência IPL/2018/aSiPhoto_ISEL
dc.description.abstractAmorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationFANTONI, Alessandro; [et al] – Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality. European Physical Journal Applied Physics. ISSN 1286-0042. Vol. 90, N.º 3 (2020), pp. 30502-p1-30502-p10pt_PT
dc.identifier.doi10.1051/epjap/2020190250pt_PT
dc.identifier.issn1286-0042
dc.identifier.issn1286-0050
dc.identifier.urihttp://hdl.handle.net/10400.21/12032
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherEDP Sciencespt_PT
dc.relationPTDC/NAN-OPT/31311/2017 - FCTpt_PT
dc.relationUID/EEA/00066/2019 - FCTpt_PT
dc.relationProjeto financiado no âmbito do Concurso de Projetos de Investigação, Desenvolvimento, Inovação & Criação Artística (IDI&CA) financiados pelo Instituto Politécnico de Lisboa. IPL/2018/aSiPhoto_ISELpt_PT
dc.subjectAmorphous siliconpt_PT
dc.subjectSimulation analysispt_PT
dc.subjectLithography imperfectionspt_PT
dc.subjectDeposition processpt_PT
dc.titleComputer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material qualitypt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage30502-p10pt_PT
oaire.citation.issue3pt_PT
oaire.citation.startPage30502-p1pt_PT
oaire.citation.titleEuropean Physical Journal: Applied Physicspt_PT
oaire.citation.volume90pt_PT
person.familyNameFantoni
person.familyNameCosta
person.familyNameVieira
person.givenNameAlessandro
person.givenNameJoão
person.givenNameManuela
person.identifier10792
person.identifier.ciencia-id241E-E87C-552F
person.identifier.ciencia-id2314-A300-7C09
person.identifier.ciencia-id9516-E25E-BB8E
person.identifier.orcid0000-0002-9938-0351
person.identifier.orcid0000-0002-8058-3685
person.identifier.orcid0000-0002-1150-9895
person.identifier.ridK-1105-2016
person.identifier.ridV-7860-2017
person.identifier.scopus-author-id7006535604
person.identifier.scopus-author-id35810047500
person.identifier.scopus-author-id7202140173
rcaap.rightsclosedAccesspt_PT
rcaap.typearticlept_PT
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relation.isAuthorOfPublication.latestForDiscoveryb77c6785-9cfb-4cd4-90b5-c2b816bd7d11

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