Browsing by Issue Date, starting with "2001-08"
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- Laser-scanned p-i-n photodiode (LSP) for image detectionPublication . Vieira, Manuela; Fernandes, Miguel; Martins, João; Louro, Paula; Maçarico, António Filipe Ruas Trindade; Schwarz, Reinhard; Schubert, Markus B.Amorphous and microcrystalline glass/ZnO:Al/p(a-Si:H)/i(a-Si:H)/n(a-Si1 C :H)/Al imagers with different n-layer resistivities were produced by plasma-enhanced chemical vapor deposition technique (PE-CVD). The transducer is a simple, large area p-i-n photodiode; an image projected onto the sensing element leads to spatially confined depletion regions that can be readout by scanning the photodiode with a low-power modulated laser beam. The essence of the scheme is the analog readout and the absence of semiconductor arrays or electrode potential manipulations to transfer the information coming from the transducer. The effect of the image intensity on the sensor output characteristics (sensitivity, linearity, blooming, resolution, and signal-tonoise ratio) are analyzed for different material composition. The results show that the responsivity and the spatial resolution are limited by the conductivity of the doped layers. An enhancement of one order of magnitude in the image intensity and on the spatial resolution is achieved with a responsivity of 0.2 mW/cm2 by decreasing the -layer conductivity by the same amount. In a 4 4 cm2 laser-scanned photodiode (LSP) sensor, the resolution was less than 100 m and the signal-to-noise (S/N) ratio was about 32 dB. Aphysical model supported by electrical simulation gives insight into the methodology used for image representation.
- ITO/SiOx/Si optical sensor with internal gainPublication . Fernandes, Miguel; Vygranenko, Yuri; Schwarz, R.; Vieira, ManuelaA visible/near-infrared optical sensor based on an ITO/SiOx/n-Si structure with internal gain is presented. This surface-barrier structure was fabricated by a low-temperature processing technique. The interface properties and carder transport were investigated from dark current-voltage and capacitance-voltage characteristics. Examination of the multiplication properties was performed under different light excitation and reverse bias conditions. The spectral and pulse response characteristics are analysed. The current amplification mechanism is interpreted by the control of electron current by the space charge of photogenerated holes near the SiOx/Si interface. The optical sensor output characteristics and some possible device applications are presented.
- New p-i-n Si : H imager configuration for spatial resolution improvementPublication . Vieira, Manuela; Fernandes, Miguel; Martins, João; Louro, Paula; Maçarico, António Filipe Ruas da Trindade; Schwarz, Reinhard; Schubert, Markus B.Amorphous glass/ZnO-Al/p(a-Si:H)/i(a-Si:H)/n(a-Si1-xCx:H)/Al imagers with different n-layer resistivities were produced by plasma enhanced chemical vapour deposition technique (PE-CVD). An image is projected onto the sensing element and leads to spatially confined depletion regions that can be readout by scanning the photodiode with a low-power modulated laser beam. The essence of the scheme is the analog readout, and the absence of semiconductor arrays or electrode potential manipulations to transfer the information coming from the transducer. The influence of the intensity of the optical image projected onto the sensor surface is correlated with the sensor output characteristics (sensitivity, linearity blooming, resolution and signal-to-noise ratio) are analysed for different material compositions (0.5 < x < 1). The results show that the responsivity and the spatial resolution are limited by the conductivity of the doped layers. An enhancement of one order of magnitude in the image intensity signal and on the spatial resolution are achieved at 0.2 mW cm(-2) light flux by decreasing the n-layer conductivity by the same amount. A physical model supported by electrical simulation gives insight into the image-sensing technique used.