Repository logo
 
Publication

Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition

2011-03-31Journal article Open access
Simple item page
dc.contributor.authorSousa, P. M.
dc.contributor.authorSilvestre, António Jorge
dc.contributor.authorConde, O.
dc.date.accessioned2012-09-07T12:25:46Z
dc.date.available2012-09-07T12:25:46Z
dc.date.issued2011-03-31
dc.description.abstractChromia (Cr2O3) has been extensively explored for the purpose of developing widespread industrial applications, owing to the convergence of a variety of mechanical, physical and chemical properties in one single oxide material. Various methods have been used for large area synthesis of Cr2O3 films. However, for selective area growth and growth on thermally sensitive materials, laser-assisted chemical vapour deposition (LCVD) can be applied advantageously. Here we report on the growth of single layers of pure Cr2O3 onto sapphire substrates at room temperature by low pressure photolytic LCVD, using UV laser radiation and Cr(CO)(6) as chromium precursor. The feasibility of the LCVD technique to access selective area deposition of chromia thin films is demonstrated. Best results were obtained for a laser fluence of 120 mJ cm(-2) and a partial pressure ratio of O-2 to Cr(CO)(6) of 1.0. Samples grown with these experimental parameters are polycrystalline and their microstructure is characterised by a high density of particles whose size follows a lognormal distribution. Deposition rates of 0.1 nm s(-1) and mean particle sizes of 1.85 mu m were measured for these films. (C) 2011 Elsevier B.V. All rights reserved.por
dc.identifier.citationSousa P M, Silvestre A J, Conde O. Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition. Thin Solid Film. 2011: 519 (11), 3653-3657.por
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/10400.21/1743
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherElsevier Science SApor
dc.subjectChromium oxidepor
dc.subjectThin filmspor
dc.subjectLow pressure laser-assisted chemical vapor depositionpor
dc.subjectParticle size distributionpor
dc.subjectX-ray diffractionpor
dc.subjectaman spectroscopypor
dc.subjectChromium-oxide filmspor
dc.subjectMagnetic-propertiespor
dc.subjectNanophase CR2O3por
dc.subjectPhase-controlpor
dc.subjectX-raypor
dc.subjectOxidationpor
dc.subjectPolycrystallinepor
dc.subjectHexacarbonylpor
dc.subjectDiffractionpor
dc.subjectCR(CO)6por
dc.titleCr2O3 thin films grown at room temperature by low pressure laser chemical vapour depositionpor
dc.typejournal article
dspace.entity.typePublication
oaire.citation.conferencePlaceLausannepor
oaire.citation.endPage3657por
oaire.citation.issue11por
oaire.citation.startPage3653por
oaire.citation.titleThin Solid Filmspor
oaire.citation.volume519por
person.familyNameSilvestre
person.givenNameAntónio Jorge
person.identifier.orcid0000-0001-6517-6275
person.identifier.scopus-author-id25224208600
rcaap.rightsrestrictedAccesspor
rcaap.typearticlepor
relation.isAuthorOfPublicationda27d795-d2eb-4f8c-bfa5-7053ef20f339
relation.isAuthorOfPublication.latestForDiscoveryda27d795-d2eb-4f8c-bfa5-7053ef20f339

Files

Original bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
Cr2O3.rep.pdf
Size:
18.08 KB
Format:
Adobe Portable Document Format
Download
License bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Download

Collections

ISEL - Física - Artigos