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Lithographic mask defects analysis on an MMI 3 dB splitter

2019-12Journal article Restricted access
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dc.contributor.authorLourenço, Paulo
dc.contributor.authorFantoni, Alessandro
dc.contributor.authorCosta, João
dc.contributor.authorVieira, Manuela
dc.date.accessioned2019-11-25T10:47:30Z
dc.date.available2019-11-25T10:47:30Z
dc.date.issued2019-12
dc.description.abstractIn this paper, we present a simulation study that intends to characterize the influence of defects introduced by manufacturing processes on the geometry of a semiconductor structure suitable to be used as a multimode interference (MMI) 3 dB power splitter. Consequently, these defects will represent refractive index fluctuations which, on their turn, will drastically affect the propagation conditions within the structure. Our simulations were conducted on a software platform that implements the Beam Propagation numerical method. This work supports the development of a biomedical plasmonic sensor, which is based on the coupling between propagating modes in a dielectric waveguide and the surface plasmon mode that is generated on an overlaid metallic thin film, and where the output readout is achieved through an a-Si:H photodiode. By using a multimode interference 1 × 2 power splitter, this sensor device can utilize the non-sensing arm as a reference one, greatly facilitating its calibration and enhancing its performance. As the spectral sensitivity of amorphous silicon is restricted to the visible range, this sensing device should be operating on a wavelength not higher than 700 nm; thus, a-SiNx has been the material hereby proposed for both waveguides and MMI power splitter.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationLOURENÇO, Paulo; [et al] – Lithographic mask defects analysis on an MMI 3 dB splitter. Photonics. ISSN 2304-6732. Vol. 6, N.º 4 (2019), pp. 1-8pt_PT
dc.identifier.doihttps://doi.org/10.3390/photonics6040118pt_PT
dc.identifier.issn2304-6732
dc.identifier.urihttp://hdl.handle.net/10400.21/10734
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherMDPIpt_PT
dc.relationPTDC/NAN-OPT/31311/2017 - FCTpt_PT
dc.relationSFRH/BPD/102217/2014 - FCTpt_PT
dc.subjecta-SiNxpt_PT
dc.subjectBeam propagation methodpt_PT
dc.subjectMultimode interferencept_PT
dc.subject3 dB splitterpt_PT
dc.titleLithographic mask defects analysis on an MMI 3 dB splitterpt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage8pt_PT
oaire.citation.issue4pt_PT
oaire.citation.startPage1pt_PT
oaire.citation.titlePhotonicspt_PT
oaire.citation.volume6pt_PT
person.familyNameLourenço
person.familyNameFantoni
person.familyNameCosta
person.familyNameVieira
person.givenNamePaulo
person.givenNameAlessandro
person.givenNameJoão
person.givenNameManuela
person.identifier10792
person.identifier.ciencia-id431F-5C2C-00FB
person.identifier.ciencia-id241E-E87C-552F
person.identifier.ciencia-id2314-A300-7C09
person.identifier.ciencia-id9516-E25E-BB8E
person.identifier.orcid0000-0002-8785-445X
person.identifier.orcid0000-0002-9938-0351
person.identifier.orcid0000-0002-8058-3685
person.identifier.orcid0000-0002-1150-9895
person.identifier.ridK-1105-2016
person.identifier.ridV-7860-2017
person.identifier.scopus-author-id7006535604
person.identifier.scopus-author-id35810047500
person.identifier.scopus-author-id7202140173
rcaap.rightsopenAccesspt_PT
rcaap.typearticlept_PT
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relation.isAuthorOfPublication9f35eb1e-83e4-4342-a86d-265604301499
relation.isAuthorOfPublicationa64d2f5a-2af3-4d5b-adb4-7de0edad0f84
relation.isAuthorOfPublicationb77c6785-9cfb-4cd4-90b5-c2b816bd7d11
relation.isAuthorOfPublication.latestForDiscoverya64d2f5a-2af3-4d5b-adb4-7de0edad0f84

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