Repository logo
 
Publication

Lithographic mask defects mitigation on a multimode interference structure

2020-09Journal article Restricted access
Simple item page
dc.contributor.authorLourenço, P.
dc.contributor.authorFantoni, Alessandro
dc.contributor.authorCosta, J.
dc.contributor.authorVieira, Manuela
dc.date.accessioned2021-02-04T12:47:33Z
dc.date.available2021-02-04T12:47:33Z
dc.date.issued2020-09
dc.descriptionEste trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2019 do Instituto Politécnico de Lisboa. Código de referência IPL/2019/BioPlas_ISEL
dc.descriptionEste trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2019 do Instituto Politécnico de Lisboa. Código de referência IPL/2019/MO-TFT_ISEL
dc.description.abstractOver the last decades, the lithographic technology has greatly contributed for the confirmation of Moore's law in the semiconductor industry. Key developments in lithography such as the operational wavelength decreasing, together with a performance increase in lens and imaging technology, enabled the reduction of cost per function in integrated circuits technology. In this work, the impact of lithographic defects introduced by the manufacturing process is analyzed through simulations and two mitigation techniques are presented. These perturbations are a consequence of the limited lithographic mask resolution reflected on deviations from the geometry of the ideal device. For this purpose, the Beam Propagation and Finite Differences Time Domain methods have been used to simulate a multi-mode interference structure based on silicon nitride. The structure is affected by random perturbations and the obtained results revealed a strong dependence between mask resolution, and imbalance and power loss. Two strategies have been followed concerning the mitigation of power loss and imbalance: - Access waveguides tapering and adjustable power splitting ratios through the electro-optic effect. Both strategies revealed results that indicate an improvement on device's performance. However, once built, the former is a static design that favors indiscriminately all propagating modes in the multimode section. In the latter, finer tuning capabilities targeting different propagating modes may be enabled by dynamic compensation of power loss and imbalance, when in a closed loop control architecture. Such a control architecture may operate by sampling the output waveguides, extracting the error signal and, finally, negatively feeding it back to the electro - optic effect system, hence improving imbalance and power loss.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationLOURENÇO, P.; [et al] – Lithographic mask defects mitigation on a multimode interference structure. Optica Pura y Aplicada. ISSN 0030-3917. Vol. 53, N.º 3 (2020), pp. 1-11pt_PT
dc.identifier.doi10.7149/OPA.53.3.51042pt_PT
dc.identifier.eissn2171-8814
dc.identifier.issn0030-3917
dc.identifier.urihttp://hdl.handle.net/10400.21/12782
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherSoc. Espanola Opticapt_PT
dc.relationLISBOA-01-0145-FEDER-031311 - European Union (EU)pt_PT
dc.relationSFRH/BD/144833/2019 - FCTpt_PT
dc.relationPTDC/NAN-OPT/31311/2017 - FCTpt_PT
dc.relationUID/EEA/00066/2020 - FCTpt_PT
dc.relationProjeto financiado no âmbito do Concurso de Projetos de Investigação, Desenvolvimento, Inovação & Criação Artística (IDI&CA) financiados pelo Instituto Politécnico de Lisboa. IPL/2019/BioPlas_ISELpt_PT
dc.relationProjeto financiado no âmbito do Concurso de Projetos de Investigação, Desenvolvimento, Inovação & Criação Artística (IDI&CA) financiados pelo Instituto Politécnico de Lisboa. IPL/2019/MO-TFT_ISELpt_PT
dc.relation.publisherversionhttps://www.sedoptica.es/Menu_Volumenes/Pdfs/OPA.53.3.51042.pdfpt_PT
dc.subjectBeam propagation methodpt_PT
dc.subjectFinite differences time domainpt_PT
dc.subjectMultimode interferencept_PT
dc.subjectLithographic resolutionpt_PT
dc.subjectGraphenept_PT
dc.subjectChemical potentialpt_PT
dc.titleLithographic mask defects mitigation on a multimode interference structurept_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage11pt_PT
oaire.citation.issue3pt_PT
oaire.citation.startPage1pt_PT
oaire.citation.titleOptica Pura y Aplicadapt_PT
oaire.citation.volume53pt_PT
person.familyNameFantoni
person.familyNameVieira
person.givenNameAlessandro
person.givenNameManuela
person.identifier10792
person.identifier.ciencia-id241E-E87C-552F
person.identifier.ciencia-id9516-E25E-BB8E
person.identifier.orcid0000-0002-9938-0351
person.identifier.orcid0000-0002-1150-9895
person.identifier.ridK-1105-2016
person.identifier.ridV-7860-2017
person.identifier.scopus-author-id7006535604
person.identifier.scopus-author-id7202140173
rcaap.rightsclosedAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublication9f35eb1e-83e4-4342-a86d-265604301499
relation.isAuthorOfPublicationb77c6785-9cfb-4cd4-90b5-c2b816bd7d11
relation.isAuthorOfPublication.latestForDiscovery9f35eb1e-83e4-4342-a86d-265604301499

Files

Original bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
Lithographic_AFantoni.pdf
Size:
701.29 KB
Format:
Adobe Portable Document Format
Download

Collections

ISEL - Eng. Elect. Tel. Comp. - Artigos