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Silicon nitride based devices: lithographic mask roughness mitigation

2020-04Other Open access
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dc.contributor.authorLourenço, Paulo
dc.contributor.authorFantoni, Alessandro
dc.contributor.authorCosta, João
dc.contributor.authorVieira, Manuela
dc.date.accessioned2023-03-01T14:27:39Z
dc.date.available2023-03-01T14:27:39Z
dc.date.issued2020-04
dc.description.abstractLithographic technology has been one of the main upholders to Moore's law in the semiconductor industry for the last decades. The underlying reason that enabled the evolution in semiconductor industry has been a steady silicon wafer printing cost, while being able to dramatically increase the number of nodes that can be printed per chip. Key developments in lithography such as wavelength decreasing, together with performance increase in lens and imaging technology, should be accounted for almost all the reduction of cost per function in integrated circuits technology. In this work, we will be presenting the simulation of two mitigation techniques for the impact of defects introduced by manufacturing processes. Namely, the lithographic mask limited resolution on the geometry of the representative device. These perturbations are a consequence of the lithographic mask limited resolution on the geometry of the representative device. For this purpose, the Beam Propagation and Finite Differences Time Domain methods will be used to simulate a multimode interference structure based on silicon nitride. The structure will be affected by previously mentioned perturbations and we expect results revealing a strong dependence between mask resolution, and imbalance and power loss. Two strategies will be followed concerning the mitigation of power loss and imbalance introduced by the limited resolution of lithographic mask: - Access waveguides tapering; - Adjustable power splitting ratios through the electro-optic effect. Through both strategies we aim to achieve an improvement on device’s performance but, in the latter are expected finer tuning capabilities, being enabled by dynamic compensation of power loss and imbalance when in a closed loop control architecture.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationLOURENÇO, Paulo; FANTONI, Alessandro; COSTA, João; VIEIRA, Manuela - Siliconnitride based devices: lithographic mask roughness mitigation, In Proc. SPIE11364, Integrated Photonics Platforms: Fundamental Research,Manufacturing and Applications, 113641Q (2 April 2020pt_PT
dc.identifier.doi10.1117/12.2555564pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.21/15737
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.relationIPL/2019/BioPlas_ISELpt_PT
dc.relationPhotoAKI: Photonic Biosensor for point of care and Early Diagnostics of Acute Kidney Injury
dc.relationPhotonic biosensor for point of care and early diagnostics of acute kidney injury
dc.relationCentre of Technology and Systems
dc.subjectBeam propagation methodpt_PT
dc.subjectFinite differences time domainpt_PT
dc.subjectMultimode interferencept_PT
dc.subject3 dB splitterpt_PT
dc.subjectLithographic mask resolutionpt_PT
dc.subjectGraphenept_PT
dc.subjectChemical potentialpt_PT
dc.titleSilicon nitride based devices: lithographic mask roughness mitigationpt_PT
dc.typeother
dspace.entity.typePublication
oaire.awardTitlePhotoAKI: Photonic Biosensor for point of care and Early Diagnostics of Acute Kidney Injury
oaire.awardTitlePhotonic biosensor for point of care and early diagnostics of acute kidney injury
oaire.awardTitleCentre of Technology and Systems
oaire.awardURIinfo:eu-repo/grantAgreement/FCT//SFRH%2FBD%2F144833%2F2019/PT
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/9471 - RIDTI/PTDC%2FNAN-OPT%2F31311%2F2017/PT
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/6817 - DCRRNI ID/UID%2FEEA%2F00066%2F2019/PT
oaire.citation.endPage12pt_PT
oaire.citation.startPage1pt_PT
oaire.fundingStream9471 - RIDTI
oaire.fundingStream6817 - DCRRNI ID
person.familyNameLourenço
person.familyNameFantoni
person.familyNameCosta
person.familyNameVieira
person.givenNamePaulo
person.givenNameAlessandro
person.givenNameJoão
person.givenNameManuela
person.identifier10792
person.identifier.ciencia-id431F-5C2C-00FB
person.identifier.ciencia-id241E-E87C-552F
person.identifier.ciencia-id2314-A300-7C09
person.identifier.ciencia-id9516-E25E-BB8E
person.identifier.orcid0000-0002-8785-445X
person.identifier.orcid0000-0002-9938-0351
person.identifier.orcid0000-0002-8058-3685
person.identifier.orcid0000-0002-1150-9895
person.identifier.ridK-1105-2016
person.identifier.ridV-7860-2017
person.identifier.scopus-author-id7006535604
person.identifier.scopus-author-id35810047500
person.identifier.scopus-author-id7202140173
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.nameFundação para a Ciência e a Tecnologia
project.funder.nameFundação para a Ciência e a Tecnologia
project.funder.nameFundação para a Ciência e a Tecnologia
rcaap.rightsopenAccesspt_PT
rcaap.typeotherpt_PT
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