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Internal structure of the nanogratings generated inside bulk fused sílica by ultrafast laser direct writing

dc.contributor.authorSharma, S. P.
dc.contributor.authorOliveira, Vitor
dc.contributor.authorHerrero, P.
dc.contributor.authorVilar, R.
dc.date.accessioned2015-08-25T10:19:07Z
dc.date.available2015-08-25T10:19:07Z
dc.date.issued2014-08
dc.description.abstractThe aim of the present work was to characterize the internal structure of nanogratings generated inside bulk fused silica by ultrafast laser processing and to study the influence of diluted hydrofluoric acid etching on their structure. The nanogratings were inscribed at a depth of 100 mu m within fused silica wafers by a direct writing method, using 1030 nm radiation wavelength and the following processing parameters: E = 5 mu J, tau = 560 fs, f = 10 kHz, and v = 100 mu m/s. The results achieved show that the laser-affected regions are elongated ellipsoids with a typical major diameter of about 30 mu m and a minor diameter of about 6 mu m. The nanogratings within these regions are composed of alternating nanoplanes of damaged and undamaged material, with an average periodicity of 351 +/- 21 nm. The damaged nanoplanes contain nanopores randomly dispersed in a material containing a large density of defects. These nanopores present a roughly bimodal size distribution with average dimensions for each class of pores 65 +/- 20 x 16 +/- 8 x 69 +/- 16 nm(3) and 367 +/- 239 x 16 +/- 8 x 360 +/- 194 nm(3), respectively. The number and size of the nanopores increases drastically when an hydrofluoric acid treatment is performed, leading to the coalescence of these voids into large planar discontinuities parallel to the nanoplanes. The preferential etching of the damaged material by the hydrofluoric acid solution, which is responsible for the pores growth and coalescence, confirms its high defect density. (C) 2014 AIP Publishing LLC.por
dc.identifier.citationSHARMA, S. P.; OLIVEIRA, Victor Manuel Barbas; HERRERO, P.; VILAR, R. – Internal structure of the nanogratings generated inside bulk fused sílica by ultrafast laser direct writing. Journal of Applied Physics. ISSN: 0021-8979. Vol. 116, nr. 5 (2014), Art. nr. 053106por
dc.identifier.doi10.1063/1.4892562
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/10400.21/4979
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherAmer Inst Physicspor
dc.relation.ispartofseries053106
dc.subjectFemtosecond Laserpor
dc.subjectTransparent Materialspor
dc.subjectIndexpor
dc.subjectGlasspor
dc.subjectDrivenpor
dc.subjectPulsespor
dc.titleInternal structure of the nanogratings generated inside bulk fused sílica by ultrafast laser direct writingpor
dc.typejournal article
dspace.entity.typePublication
oaire.citation.conferencePlaceMelvillepor
oaire.citation.issue5por
oaire.citation.titleJournal of Applied Physicspor
oaire.citation.volume116por
person.familyNameOliveira
person.givenNameVitor
person.identifier.ciencia-idDA1C-25BD-5974
person.identifier.orcid0000-0002-1757-4524
person.identifier.ridA-3058-2009
person.identifier.scopus-author-id7006105706
rcaap.rightsclosedAccesspor
rcaap.typearticlepor
relation.isAuthorOfPublication269ff9af-427f-4d1d-949c-cd77cd386e9f
relation.isAuthorOfPublication.latestForDiscovery269ff9af-427f-4d1d-949c-cd77cd386e9f

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