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Mass spectrometry improvement on an high current ion implanter

dc.contributor.authorLopes, J. Gabriel
dc.contributor.authorAlegria, F. C.
dc.contributor.authorLuis Redondo
dc.contributor.authorRocha, J.
dc.contributor.authorAlves, E.
dc.date.accessioned2013-02-15T16:25:52Z
dc.date.available2013-02-15T16:25:52Z
dc.date.issued2011-12-15
dc.description.abstractThe development of accurate mass spectrometry, enabling the identification of all the ions extracted from the ion source in a high current implanter is described. The spectrometry system uses two signals (x-y graphic), one proportional to the magnetic field (x-axes), taken from the high-voltage potential with an optic fiber system, and the other proportional to the beam current intensity (y-axes), taken from a beam-stop. The ion beam mass register in a mass spectrum of all the elements magnetically analyzed with the same radius and defined by a pair of analyzing slits as a function of their beam intensity is presented. The developed system uses a PC to control the displaying of the extracted beam mass spectrum, and also recording of all data acquired for posterior analysis. The operator uses a LabView code that enables the interfacing between an I/O board and the ion implanter. The experimental results from an ion implantation experiment are shown. (C) 2011 Elsevier B.V. All rights reserved.por
dc.identifier.citationLOPES, J. G.; ALEGRIAl, F. C.; REDONDO, L. M.; ROCHA, J.; ALVESl, E. - Mass spectrometry improvement on an high current ion implanter. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. ISSN 0168-583X. Vol. 269, n.º 24 (2011) p. 3222-3225.por
dc.identifier.issn0168-583X
dc.identifier.urihttp://hdl.handle.net/10400.21/2212
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherElsevier Science BVpor
dc.subjectHigh current ion implanterpor
dc.subjectLabViewpor
dc.subjectMass spectrumpor
dc.subjectHyperfine interactionspor
dc.subjectSapphirepor
dc.subjectBeampor
dc.titleMass spectrometry improvement on an high current ion implanterpor
dc.typejournal article
dspace.entity.typePublication
oaire.citation.conferencePlaceAmsterdampor
oaire.citation.endPage3225por
oaire.citation.issue24por
oaire.citation.startPage3222por
oaire.citation.titleNuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atomspor
oaire.citation.volume269por
person.familyNameRedondo
person.givenNameLuis
person.identifier1017419
person.identifier.ciencia-id5E13-9730-4651
person.identifier.orcid0000-0002-2381-4627
person.identifier.ridA-3078-2009
person.identifier.scopus-author-id7003990641
rcaap.rightsrestrictedAccesspor
rcaap.typearticlepor
relation.isAuthorOfPublication1d3e3435-66c8-4d32-8ffc-d5798a8533a4
relation.isAuthorOfPublication.latestForDiscovery1d3e3435-66c8-4d32-8ffc-d5798a8533a4

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