Browsing by Author "Lopes, J. Gabriel"
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- Ion beam monitoring over a biased targetPublication . Lopes, J. Gabriel; Rocha, J.; Catarino, N.; Peres, M.A specially designed beam profile monitor (BPM) was produced to be assembled over a biased target plate, with the aim of studying the effect of an ion beam deceleration system on the beam fluence due to beam dispersion. The new BPM was developed with a shape as flat as possible, so it could be attached to a biased target plate without affecting the target geometry, using a slit scan method to produce an high-resolution beam profile. This system was designed and installed on the high current ion implanter at the Laboratorio de Aceleradores e Tecnologias de Radiacao, at the Campus Tecnologico e Nuclear, of Instituto Superior Tecnico, in Lisbon. The system is capable of showing the ion beam profile for low-energy ion beams below 15 keV, using a beam deceleration system.
- Mass spectrometry improvement on an high current ion implanterPublication . Lopes, J. Gabriel; Alegria, F. C.; Luis Redondo; Rocha, J.; Alves, E.The development of accurate mass spectrometry, enabling the identification of all the ions extracted from the ion source in a high current implanter is described. The spectrometry system uses two signals (x-y graphic), one proportional to the magnetic field (x-axes), taken from the high-voltage potential with an optic fiber system, and the other proportional to the beam current intensity (y-axes), taken from a beam-stop. The ion beam mass register in a mass spectrum of all the elements magnetically analyzed with the same radius and defined by a pair of analyzing slits as a function of their beam intensity is presented. The developed system uses a PC to control the displaying of the extracted beam mass spectrum, and also recording of all data acquired for posterior analysis. The operator uses a LabView code that enables the interfacing between an I/O board and the ion implanter. The experimental results from an ion implantation experiment are shown. (C) 2011 Elsevier B.V. All rights reserved.