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Boron-doped nanocrystalline silicon thin films for solar cells

dc.contributor.authorFathi, E.
dc.contributor.authorVygranenko, Yuri
dc.contributor.authorVieira, Manuela
dc.contributor.authorSazonov, A.
dc.date.accessioned2013-01-30T19:21:38Z
dc.date.available2013-01-30T19:21:38Z
dc.date.issued2011-08-15
dc.description.abstractThis article reports on the structural, electronic, and optical properties of boron-doped hydrogenated nanocrystalline silicon (nc-Si: H) thin films. The films were deposited by plasma-enhanced chemical vapour deposition (PECVD) at a substrate temperature of 150 degrees C. Crystalline volume fraction and dark conductivity of the films were determined as a function of trimethylboron-to-silane flow ratio. Optical constants of doped and undoped nc-Si: H were obtained from transmission and reflection spectra. By employing p(+) nc-Si: H as a window layer combined with a p' a-SiC buffer layer, a-Si: H-based p-p'-i-n solar cells on ZnO:Al-coated glass substrates were fabricated. Device characteristics were obtained from current-voltage and spectral-response measurements. (C) 2011 Elsevier B. V. All rights reserved.por
dc.identifier.citationFATHI, E.; VYGRANENKO, Y.; VIEIRA, M.; SAZONOV, A. - Boron-doped nanocrystalline silicon thin films for solar cells. Applied Surface Science. ISSN 0169-4332. Vol. 257, n.º 21 (2011) p. 8901-8905.por
dc.identifier.issn0169-4332
dc.identifier.urihttp://hdl.handle.net/10400.21/2112
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherElsevier Science BVpor
dc.subjectThin solid filmspor
dc.subjectNanocrystalline siliconpor
dc.subjectPECVDpor
dc.subjectSolar cellspor
dc.subjectMicrocrystalline siliconpor
dc.subjectAmorphous-siliconpor
dc.subjectRaman-spectroscopypor
dc.subjectSI nanocrystalspor
dc.subjectP-layerpor
dc.subjectThicknesspor
dc.subjectHydrogenpor
dc.subjectSilanepor
dc.subjectWindowpor
dc.subjectSeedpor
dc.titleBoron-doped nanocrystalline silicon thin films for solar cellspor
dc.typejournal article
dspace.entity.typePublication
oaire.citation.conferencePlaceAmsterdampor
oaire.citation.endPage8905por
oaire.citation.issue21por
oaire.citation.startPage8901por
oaire.citation.titleApplied Surface Sciencepor
oaire.citation.volume257por
person.familyNameVygranenko
person.familyNameVieira
person.givenNameYuri
person.givenNameManuela
person.identifier10792
person.identifier.ciencia-id121C-05B4-3897
person.identifier.ciencia-id9516-E25E-BB8E
person.identifier.orcid0000-0002-1819-5606
person.identifier.orcid0000-0002-1150-9895
person.identifier.ridV-7860-2017
person.identifier.scopus-author-id6701808217
person.identifier.scopus-author-id7202140173
rcaap.rightsrestrictedAccesspor
rcaap.typearticlepor
relation.isAuthorOfPublication5471872c-b778-4218-9ac1-677868dd7d43
relation.isAuthorOfPublicationb77c6785-9cfb-4cd4-90b5-c2b816bd7d11
relation.isAuthorOfPublication.latestForDiscoveryb77c6785-9cfb-4cd4-90b5-c2b816bd7d11

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