Utilize este identificador para referenciar este registo: http://hdl.handle.net/10400.21/1761
Título: Laser-assisted deposition of thin films from photoexcited vapour phases
Autor: Conde, O.
Silvestre, A. J.
Palavras-chave: Chromium-Oxide Films
Dioxide CRO2 Films
Boron-Carbide
Spin Polarization
Carbon Precursor
Infrared-Spectra
Point-Contact
Growth
CR(CO)6
Metal
Data: Ago-2004
Editora: Springer
Citação: Conde O, Silvestre, A J. Laser-assisted deposition of thin films from photoexcited vapour phases. Applied Physics A-Materials Science & Processing. 2004: 79 (3), 489-497.
Resumo: Laser-assisted chemical vapour deposition (LCVD) has been extensively studied in the last two decades. A vast range of applications encompass various areas such as microelectronics, micromechanics, microelectromechanics and integrated optics, and a variety of metals, semiconductors and insulators have been grown by LCVD. In this article, we review briefly the LCVD process and present two case studies of thin film deposition related to laser thermal excitation (e.g., boron carbide) and non-thermal excitation (e.g., CrO(2)) of the gas phase.
Peer review: yes
URI: http://hdl.handle.net/10400.21/1761
ISSN: 0947-8396
Aparece nas colecções:ISEL - Física - Artigos

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