Utilize este identificador para referenciar este registo: http://hdl.handle.net/10400.21/1757
Título: CVD of CrO(2): Towards a lower temperature deposition process
Autor: Sousa, Pedro M.
Dias, Sonia A.
Silvestre, A. J.
Conde, Olinda
Morris, Benjamin
Yates, Karen A.
Branford, William R.
Cohen, Lesley F.
Palavras-chave: Chemical-Vapor-Deposition
Half-Metallic CRO2
Oxide Thin-Films
Spin Polarization
Andreev Reflection
Epitaxial-Growth
Point-Contact
Magnetoresistance
Transition
Data: Dez-2006
Editora: Wiley-Blackwell
Citação: Sousa Pedro M, Dias Sonia A, Silvestre A J, Conde Olinda, Morris Benjamin, Yates Karen, Branford William R, Cohen Lesley F. CVD of CrO(2): Towards a lower temperature deposition process. Chemical Vapor Deposition. 2006: 12 (12).
Resumo: The deposition of highly oriented a-axis CrO(2) films onto Al(2)O(3)(0001) by atmospheric pressure (AP)CVD at temperatures as low as 330 C is reported. Deposition rates strongly depend on the substrate temperature, whereas for film surface microstructures the dependence is mainly on film thickness. For the experimental conditions used in this work, CrO(2) growth kinetics are dominated by a surface reaction mechanism with an apparent activation energy of (121.0 +/- 4.3) kJ mol(-1). The magnitude and temperature dependence of the saturation magnetization, up to room temperature, is consistent with bulk measurements.
Peer review: yes
URI: http://hdl.handle.net/10400.21/1757
ISSN: 0948-1907
Aparece nas colecções:ISEL - Física - Artigos

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